Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment for platinum silicide application
出版社：
Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment for platinum silicide application
会议名称：
5th International Symposium on Next-Generation Electronics, ISNE 2016
摘要：
Benefit from the good etching and patterning possibilities and its electrical properties, platinum silicide attracts renewed attention as a suitable candidate for next generation CMOS technologies recently. This work focuses on the effects of the trimethylaluminum (TMA) pretreatment on the PEALD growth of Pt film on Si substrate by using MeCpPtMe
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