Replication and subdivision of chromium nano-grating in atom lithography
出版社：
Replication and subdivision of chromium nano-grating in atom lithography
会议名称：
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V
摘要：
Atom lithography is a novel technique for nanofabrication which can be used to grow periodic arrays of highly uniform nanometer-scale structures. The pitch standard of Cr nano-grating is 212.8?±0.1 nm, which coincides with ??/2 of the standing wave, in correspondence with the
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