Improved Operation Characteristics for Nonvolatile Charge-Trapping Memory Capacitors with High-κ Dielectrics and SiGe Epitaxial Substrates

侯朝昭王桂磊项金娟姚佳欣吴振华张青竹殷华湘 · 0

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Dielectrics and SiGe Epitaxial Substrates

Improved Operation Characteristics for Nonvolatile Charge-Trapping Memory Capacitors with High

摘要：

A novel high-κ, Al_2O_3/HfO_2/Al_2O_3 nanolaminate charge trapping memory capacitor structure based on SiGe substrates with low interface densities is successfully fabricated and investigated. The memory capacitor exhibits excellent program-erasable ch...